W-5920i Oscillator Inline Etching System
- Linear input to output process flow for easy inline system integration
- Oscillator SMD and VCXO devices are adjusted to target frequency by Ion Beam Etching of the electrode material
- The motional parameters of the crystal remain virtually unchanged
- Up to thirty-two (32) parts are processed simultaneously for high system throughput
- Small crystal electrodes are as easy to precisely adjust as large electrodes
- Measured parameters are checked against easy to define Q.C. limits
- Supports small SMD sizes including 3.2x5.0, 3.2x2.5, 2.5x2.0, 2.0x1.6, 1.6x1.25
- Transport boats carry SMD devices in S&A flip pallets
- Many pallet matrix configurations available including 16x40, 8x60, 8x30
SPECIFICATIONS
| Measurement Range: | 32 KHz to 622 MHz |
| Etching Performance: | ± 1 ppm typical final frequency |
SYSTEM CONFIGURATION
- S&A MFC-100 Card
- S&A 250B-1 or 250C Network Analyzer
- Direct Drive Roughing Pump
- Cryo Pump
- S&A Ion Gun
- Computer
- Windows® based System Software
- Light Pole
FACILITY REQUIREMENTS
| Power: | 380VAC/208VAC 3-PHASE, 7KVA, 50/60 Hz |
| Inlet Pressures: Air: Nitrogen: Process Gas: |
90 – 100 PSIG 90 – 100 PSIG 70 – 100 PSIG 20 PSIG |
| Dimensions: | W 53" x D 37" x H 88" |