SYSTEM CONFIGURATION  •  Direct Drive Roughing Pump  •  Light Pole  •  System Software  •  Elevator Subsystem  •  Computer  •  Two counter cards  •  Power Supply  •  Cryo Pump  •  Ion Gun  SAUNDERS & ASSOCIATES, INC.  6300226-02  FACILITY REQUIREMENTS  •  Power: 208VAC  3-Phase, 7KVA, 50/60 Hz  •   Inlet Pressure: 90-100 PSIG
Air: 90 - 100 PSIG
Nitrogen: 70 - 100 PSIG
Process Gas: 10 PSIG
Dimensions W 53" x D 37" x H 88"  MEASUREMENTS  •  Oscillator Frequency  •  Center Frequency Search on VCXO  •  Frequency pullability test on VCXO  Software screen measurements

 Measurement Frequency R ange:  1 MHz to 300 MHz  Throughput:  Device Dependent  S&A              5920 OSCILLATOR FINAL
FREQUENCY ADJUSTMENT SYSTEM  SPECIFICATIONS  •  SMD Oscillator and VCXO devices are
adjusted to target frequency by Ion Beam
Etching of the electrode material  •  The motional parameters of the crystal remain
virtually unchanged  •  Sixteen parts are processed simultaneously
for high system throughput  •  Small crystal electrodes are as easy to
precisely adjust as large electrodes  •  Measured parameters are checked against
easy to define Q.C. limits  •  Elevator subsystem continuously
handles two magazines  •  Each magazine holds five transport
boats  •  Transport boats carry SMD devices in
two  S&A pallets  •  SMD devices are continuously loaded,
unloaded and adjusted to frequency  Magazine with tray  US PATENT 6,273,991 B1